Polikristal SnO_2 İnce Filmin Kalınlık ve Optik Sabitlerinin Zarf Yöntemi ile Belirlenmesi

SnO2 (kalay dioksit) ince film ticari cam alttaban üzerinde 420oC’de püskürtme tekniği ile depolanmıştır. XRD analizleri SnO2 ince filmin tetragonal rutil yapıya sahip olduğunu göstermiştir. Filmin optik geçirgenlik değerleri (% T) görünür bölgede % 80-96 aralığındadır ve son derece şeffaftır. Soğurma katsayıları (α) geçirgenlik spektrumundan hesaplanmıştır. Kırılma indisleri (n) ve film kalınlığı (t) zarf yöntemi kullanılarak optik geçirgenlik eğrisinin girişimlerinden belirlenmiştir. Ultraviyole-görünür-yakın kızılötesi (UV-VIS-NIR) bölgelerinde kırılma indisleri (n) 1.83-1.97 aralığında değişmiştir. SnO2 ince filmin kalınlığı (t) ve optik enerji aralığı, sırasıyla 1.22 μm ve 3.98 eV olarak bulunmuştur.

Anahtar Kelimeler:

Püskürtme tekniği, Zarf yöntemi, Optik sabitler, Optik sabitler, SnO_2 ince film

Determination of The Thickness and Optical Constants of Polycrystalline SnO_2 Thin Film by Envelope Method

SnO2 (tin dioxide) thin film was deposited on commercial glass substrate by spray pyrolysis technique at 420oC. The XRD analyses indicated that the SnO2 thin film is found to tetragonal rutile structure. Optical transmission values (T %) of the film are the range of 80-96 % in the visible region and its highly transparent. The absorption coefficients (α) were defined from transmission spectrum. Refractive indices (n) and film thickness (t) were determined from interferences of the optical transmission curve with envelope method. The refractive indices (n) were altered between 1.83-1.97 in the ultraviolet-visible-near-infrared (UV-VIS-NIR) regions. The thickness (t) and optical energy gap (Eg) of the SnO2 thin film were found to be 1.22 μm and 3.98 eV, respectively.

Keywords:

Spray pyrolysis technique, Envelope method, Optical constants, SnO_2 thin film,

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El-Etre, A.Y., Reda, S.M., Characterization of nanocrystalline SnO2 thin film fabricated by electrodeposition method for dye-sensitized solar cell application, Appl. Surf. Sci., 256, 6601–6606, 2010.
Rajaram, P., Goswami, Y.C., Rajagopalan, S., Gupta, V.K., Optical and structural properties of SnO2 films grown by a low-cost CVD technique, Mater. Lett., 54, 158–163, 2002.
Al-Jawad S.M.H., Influence of multilayer deposition on characteristics of nanocrystalline SnO2 thin films produce by sol-gel technique for gas sensor application, Optik, 146, 17–26, 2017.
Park, G.S., Yang, G.M., Characterization of SnO2 films on glass by transmission electron microscopy, Thin Solid Films, 365, 7–11, 2000.
Yu, F., Tang, D., Hai, K., Luo, Z., Chen, Y., He, X., Peng, Y., Yuan, H., Zhao, D., Yang, Y., Fabrication of SnO2 one-dimensional nanosturctures with graded diameters by chemical vapor deposition method, J. Cryst. Growth, 312, 220-225, 2010.
Marikkannan, M., Vishnukanthan, V., Vijayshankar, A., Mayandi, J., Pearce, J. M., A novel synthesis of tin oxide thin films by the sol-gel process for optoelectronic applications, AIP Advances, 5, 027122, 2015.
Han, J.B., Zhou, H.J., Wan, Q.Q., Conductivity and optical nonlinearity of Sb doped SnO2 films, Mater. Lett., 60, 252–254, 2006.
Liu, S., Ding, W., Gu, Y., Chai, W., Effect of Sb doping on the microstructure and optoelectrical properties of Sb-doped SnO2 films prepared by spin coating, Phys. Scr., 85, 065601–06560, 2012.
Lajnef, M., Ezzaouia, H., Chtourou, R., Optical characterization of InAs film grown on SnO2 substrate by the electrodeposition technique, J. Phys. D: Appl. Phys., 41, 125302–125305, 2008.
Murakami, K., Nakajima, K., Kaneko, S., Initial growth of SnO2 thin film on the glass substrate deposited by the spray pyrolysis technique, Thin Solid Films, 515, 8632–8636, 2007.
Gumus, C., Ulutas C., Ufuktepe Y., Optical and structural properties of manganese sulfide thin films, Opt. Mater., 29, 1183-1187, 2007.
Kim, T.W., Lee, D.U., Coho, D.C., Yoon, Y.S., Microstructural and optical properties of SnO2 thin films grown on heavily doped n-InP (100) substrates, Appl. Phys. Lett., 79, 2187-2189, 2001.
Swanepoel, R., Determination of the thickness and optical constants of amorphous silicon, J. Phys. E: Sci. Instrum., 16, 1214–1222, 1983.
Guneri, E., Gumus, C., Mansur, F., Kirmizigul, F., Studies on properties of sprayed SnO2 thin films as a function of substrate-nozzle distance and substrate temperature, Optoelectron. Adv. Mat., 3, 383-389, 2009.
Demiryont, H., Nietering, K., Surowiec, R., Brown, F. I., Platts, D. R., Optical properties of spray-deposited tin oxide films, Appl. Opt., 18, 3803-3810, 1987.
Abhirami, K. M., Matheswaran, P., Gokul, B., Sathyamoorthy, R., Asokan, K, Swift heavy ion provoked structural, optical and electrical properties in SnO2 thin films, Applied Physics A, 111, 1175–1180, 2012.