Elektrodepozisyon Yapılan ZnO İnce Filmlerinin Korozyon Davranışı

Elektrokimyasal büyütme metodu, homojen ince filmlerin oluşumunun mümkün olması, düşük maliyeti, nano-yapıların elde edilebilirliğinin kolaylığı, büyük yüzey alanlı büyütmelerin gerçekleştirilebilirliği ve stokiyometrideki kontrolü gibi avantajlara sahip olması nedeniyle yaygın bir şekilde kullanılmaktadır. Bu çalışmada, nano-yapılı çinko oksit (ZnO) ince filmler elektrokimyasal büyütme metodu kullanarak indiyum tin oksit (ITO) kaplı cam altlıklar üzerine büyütülmüştür. Filmlerin kalitesi üzerine katodik potansiyel, zaman, sıcaklık ve pH etkileri analiz edilmiştir. ZnO ince filmler dimetil sülfoksit’te (DMSO) 130 °C sıcaklıkta 3600 sn büyütme süresinde -1.0 V katodik potansiyelde elde edilmiştir. X-ışını kırınımı (XRD) analizi, ZnO ince filmlerin açıkça (0002) tercihi yöneliminde tek kristal özelliğe sahip olduğunu doğrulamaktadır. Soğurma ölçümlerine göre, ZnO filminin optik band aralığı (Eg) 3.4 eV olarak hesaplanmıştır. ITO altlık üzerine elektrodepozisyon yapılan ZnO ince filmlerin korozyon özellikleri elektrokimyasal empedans spektroskopisi (EIS) ve Tafel ölçümleriyle incelenmiştir. Nyquist, açık devre potansiyeli (OCV) ve Bode analizi ZnO’nun yapısal değişimini ve korozyon davranışını anlamak için oluştutulmuş ve Nyquist eğrisine fit yapılarak elde edilen çözelti direnci (Rs), polarizasyon direnci (Rp), sabit faz elementi (CPEdl) ve sabit faz elementi üstel değeri (n) sırasıyla 49.61 Ω, 4.97x10-6 Ω, 6.75x10-6 Ω-1.s.cm-2 ve 0.940 olarak hesaplanmıştır. Tafel eğrisine fit yapılarak elde edilen korozyon potansiyeli (Ekor) ve korozyon akımı (Ikor) sırasıyla -0.199 V ve 2.97x10-8 A olarak elde edilmiştir. Tüm ölçümler dikkate alındığında, büyük korozyon direncinin nedeninin büyütme sırasında oluşan kusurların artışına bağlı olarak yüzey pasivasyonuyla açıklanabilir.

Anahtar Kelimeler:

EIS, Elektrodepozisyon, Tafel, XRD, ZnO

Corrosion Behaviour Of Electrodeposited ZnO Thin Films

Electrochemical deposition method (ECD) has been widely used due to its advantages in stoichiometry control, large area growth, easy to form nano-structures, being low coast, possible formation of homogeneous thin films. In this study, nanostructured zinc oxide (ZnO) thin films were deposited on Indium tin oxide (ITO)-coated glass substrate using ECD. The effects of cathodic potential, time, temperature and pH on quality of the films were examined. ZnO thin films were achieved with in cathodic potential with -1.0 V and deposition time with 3600 seconds at temperature 130°C in dimethyl sulfoxide (DMSO). X-ray diffraction (XRD) analysis confirmed clearly that the ZnOthin films have sinle crystalline properties with a strong c-axis (0002) preferential orientation. According to the absorption measurements, the optical bandgap of the ZnOfilm was calculated as Eg 3.4 eV. ZnO thin films electrodeposited on ITO substrate were studied with Electrochemical Impedance Spectroscopy (EIS) and Tafel measurements. Nyquist, open circuit potential and Bode analysis were evaluated to find out the structural changing of ZnOand its corrosion behavior. With the help of these plots, solution resistance (Rs), polarization resistance (Rp), a constant phase element (CPE) and a CPE exponent (n) were calculated as 49.61 Ω, 4.97x106 Ω, 6.75x10-6 Ω-1.s.cm-2, 0.940, respectively. Also, we examined the ZnO thin films corrosion features with the help of tafel measurements. Considering all these measurement, the possible reason of increasing corrosion resistance can be interpreted as surface passivation depending on increasing defects caused by deposition.

Keywords:

EIS, Electrodeposition, Tafel, XRD, ZnO,

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