Dielectric permittivity, ac conductivity and electric modulus properties of metal/ferroelectric/semiconductor (MFS) structures

Keywords:

MFS structures; C-V and G/ω-V measurements; dielectric permittivity; ac,

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N.V. Giridharan, R. Varatharajan, R. Jayavel, P. Ramasamy, Mater. Chem. Phys. 65 (2000) 261
A. Mansingh, Ferroelectrics 102 (1990) 69.
N. Kumari, J. Parui, K.B.R. Varma, S.B. Krupanidhi, Solid State Comm. 137 (2006) 566.
T.A. Rost, H. Lin, T.A. Rabson, Appl. Phys. Lett. 59 (1991) 3654.
Zh. Wang, Ch.H. Yang, X.Y. Yu, T. Yu, J. Crys. Growth 280 (2005) 557.
T. Hirai, K. Teramoto, K. Nagashima, Jpn. J. Appl. Phys. 34 (1995) 4163.
J.J. Zhang, J. Sun, X.J. Zheng, Solid-State Electron. 53 (2009) 170.
V.R. Palkar, S.C. Purandare, R. Pinto, J. Phys. D: Appl. Phys. 32 (1999) R1.
E. Rokuta, Y. Hotta, T. Kubota, H. Tabata, H. Kobayashi, T. Kawaia, Appl. Phys. Lett. 79 (2001) 403.
K. Aizawa, E. Tokumitsu, K. Okamoto, H. Ishawara, Appl. Phys. Lett., 7 (2000) 2609.
F. Parlaktürk, Ş. Altındal, A. Tataroğlu, M. Parlak, A. Agasiev, Microelectron. Eng. 85 (2008) 81.
C.K. Lee, W.S. Kim, H. Park, H. Jeon, Y.H. Pae, Thin Solid Films 473 (2005) 335.
A. Fouskova, L.E. Cross, J. Appl. Phys. 41 (1970) 2834.
L.B. Kong, J. Ma, Thin Solid Films 379 (2000) 89.
S.Y. Wu, J. Appl. Phys. 50 (1979) 4314.
D. Wu, A. Li, N. Ming, Microelectron. Eng. 66 (2003) 773.
J.P. Han, T.P. Ma, Appl. Phys. Lett. 72 (1998) 1185.
P.C. Joshi, S.B. Desu, J. Appl. Phys. 80 (1996) 2349.
E.B. Araujo, J.A. Eiras, J. Phys. D: Appl. Phys. 32 (1999) 957.
W.L. Liu, H.R. Xia, H. Han, X.Q. Wang, J. Crys. Growth 264 (2004) 351.
Ş. Altındal, F. Parlaktürk, A. Tataroğlu, M.M. Bülbül, J. Optoelectron. Adv. Mater. 12 (2010) 2139.
E.H. Nicollian, J.R. Brews, Metal oxide semiconductor (MOS) physics and technology, John Willey & Sons, New York, 1982.
E.H. Nicollian and A. Goetzberger, Appl. Phys. Lett. 7 (1965) 216. [24] M.D. Kannan, S.K. Balasubramanian, D. Mangalaraj, Phys. Stat. Sol. (a) 121 (1990) 515. Narayandass, C.
Zh. Wang, Ch.H. Yang, X.Y. Yu, T. Yu, J. Crys. Growth 280 (2005) 557.
L. Fu, K. Liu, B. Zhang, J. Chu, Appl. Phys. Lett. 72 (1998) 1784. [27] P. Matheswaran, R. Saravanakumar, S. Velumani, Mater. Sci. Eng. B 174 (2010) 269. Sathyamoorthy, R.
K. Prabakar, S.K. Narayandass, D. Mangalaraj, Phys. Stat. Sol. (a) 199 (2003) 507. [29] J.H. Werner, Metallization Semiconductor Interface, Plenum, New York, 1989. and Metal
N.G. McCrum, B.E. Read, G. Williams, Anelastic and Dielectric Effects in Polymeric Solids, Wiley, New York, 1967. [31] A. Eroğlu, A. Microelectron. Eng. 91 (2012) 154. Ş. Altındal,
M.M. Abdel Kader, M.Y. Elzayat, T.R. Hammad, A.I. Aboud, H. Abdelmonem, Phys. Scr. 83 (2011) 035705.
D. Cheng, Field and Wave Electromagnetics, 2nd Ed., Addison-Wesley, New York, 1989.
A. Chelkowski, Dielectric Physics, Elsevier, Amsterdam, 1980.
M. Popescu, I. Bunget, Physics of Solid Dielectrics, Elsevier, Amsterdam, 1984.
A. Tataroğlu, J. Optoelectron. Adv. Mater. 13 (2011) 940.
S. Maity, D. Bhattacharya, S.K. Ray, J. Phys. D: Appl. Phys. 44 (2011) 095403. [38] L. Kungumadevi, R. Subbarayan, Solid-State Electron. 54 (2010) 58. Sathyamoorthy, A.
J.S. Kim, H.J. Lee, S.Y. Lee, I.W. Kim, S.D. Lee, Thin Solid Films 518 (2010) 6390.
N. Singh, A. Agarwal, S. Sanghi, Current Appl. Phys. 11 (2011) 783.
E.B. Araşjo, J.A. Eiras, J. Phys. D: Appl. Phys. 32 (1999) 957.
A.K. Dubey, P. Singh, S. Singh, D. Kumar, O. Parkash, J. Alloys Compd. 509 (2011) 3899.
M.A. Elkestawy, S. Abdel kader, M.A. Amer, Physica B 405 (2010) 619.
A.M. Farid, H.E. Atyia, N.A. Hegab, Vacuum 80 (2005) 284.
A.A.M. Farag, A.M. Mansour, A.H. Ammar, M. Abdel Rafea, A.M. Farid, J.Alloys Compd. 513 (2012) 404.
K.C. Verma, M. Ram, J. Singh, R.K. Kotnala, J. Alloys Compd. 509 (2011) 4967.
L. Agrawal, A. Dutta, S. Shannigrahi, B.P. Singh, T.P. Sinha, Physica B 406 (2011)
M.P. Kumar, T. Sankarappa, G.B. Devidas, P.J. Sadashivaiah, Mater. Sci. Eng. 2 (2009) 012050.
B. Louati, F. Hlel, K. Guidara, J. Alloys Compd. 486 (2009) 299.
,.A. Hegab, M.A. Afifi, H.E. Atyia, A.S. Farid, J. Alloys Compd. 477 (2009) 925.
A.K. Jonscher, Universal Relaxation Law, Chelsea Dielectric Press, London, 1996.
F. Yakuphanoğlu, Physica B 393 (2007) 139.
T.Z. Rizvi, A. Shakoor, J. Phys. D: Appl. Phys. 42 (2009) 095415.
Moti Ram, S. Chakrabarti, J. Alloys Compd. 462 (2008) 214.
R. Ertuğrul, A. Tataroğlu, Chin. Phys. Lett. 29(7) (2012) 077304.
I.S. Yahia, M.S. Abd El-sadek, F. Yakuphanoğlu, Dyes and Pigments 93 (2012) 1434.
M.B. Mohamed, H. Wang, H. Fuess, J. Phys. D: Appl. Phys. 43 (2010) 455409.

Gazi University Journal of Science-Cover

Yayın Aralığı: Yılda 4 Sayı
Başlangıç: 1988
Yayıncı: Gazi Üniversitesi, Fen Bilimleri Enstitüsü

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