PLAZMA DALDIRMA İYON İMPLANTASYONU VE BİRİKTİRME (PIII&D) PROSESİ GERİLİMLERİNİN AZOT PLAZMASINDA ORTOPEDİK İMPLANT MALZEMESİ Ti6Al4V YÜZEYİNDE OLUŞTURULAN Ag KAPLAMALARININ MORFOLOJİLERİNE, FAZ OLUŞUMLARINA ve E-Coli. ADEZYONUNA ETKİLERİ

Öz Gümüşün antimikrobiyal etkisini ve titanyum nitrürün mekanik ve kimyasal özelliklerini birleştirmek için, ortopedik implant malzemesi olarak kullanılan Ti6Al4V alaşımının yüzeyine N2 plazmasında plazma daldırma iyon implantasyonu ve biriktirme (PIII&D) yöntemi ile gümüş biriktirilmiştir. Kaplamalar, PIII&D prosesinin farklı negatif darbeli yüksek gerilim ve magnetron sıçratma gerilimi değerleri kullanılarak elde edilmiştir. Kaplamaların yüzey morfolojileri atomik kuvvet mikroskobu (AFM) ve kesit morfolojileri ise alan emisyonlu taramalı elektron mikroskobu (FE-SEM) kullanılarak tespit edilmiştir. Kaplamaların fazları ve kimyasal kompozisyonları sırasıyla X-ışını difraksiyonu (XRD) ve X-ışını fotoelektron spektroskopisi (XPS) kullanılarak tespit edilmiştir. Buna ek olarak, numunelerin yüzeyinden içeri Ag iyonlarının nüfuziyetini belirlemek için XPS derinlik profili (depth profile) analizi yapılmıştır. In-vitro biyouyumluluk deneylerinde numunelerin yüzeylerine 99mTc radyoizotopu ile işaretlenmiş E.coli (Escherichia coli) mikroorganizmasının adezyonu araştırılmıştır. Çalışmada, 8 kV'luk negatif darbeli gerilimin kullanıldığı deneylerle elde edilen kaplamalarda gümüşün dominant olduğu; bunun yanında, negatif darbeli yüksek gerilimin artmasıyla yüzeyde gümüş miktarının azaldığı gözlemlenmiştir.

Anahtar Kelimeler:

Titanyum nitrür, Gümüş; Plazma daldırma iyon implantasyonu ve biriktirme (PIII&D); X-ışını fotoelektron spektroskopisi (XPS)

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