Sol-Gel Döndürerek Kaplama Tekniği ile Saydam İletken ZnO İnce Filmlerin Üretilmesi ve Karakterizasyonu

Sürekli gelişen optoelektronik teknolojisi alternatif saydam iletken oksit (SİO) malzemelere ihtiyaç duymaktadır. Optik geçirgenliklerinin yüksek olmasından ve iletken olmalarından dolayı SİO malzemelerin birçok uygulama alanı vardır. Çinko oksit (ZnO) ince filmler de, SİO malzemelerin en önemlilerinden biri olup optoelektronik teknolojisinde sıklıkla kullanılır. Bu çalışmada, ZnO ince filmler basit ve düşük maliyetli bir ince film kaplama tekniği olan sol-gel döndürerek kaplama tekniği ile cam taban üzerine üretilmiş ve üretilen ince filmler farklı sıcaklıklarda hava ortamında tavlanmıştır. Döndürerek kaplama tekniğinin parametreleri değiştirilerek üretilen ince filmlerde en iyi kristalleşmeyi gösteren filmlerin oluşacağı şartlar X-Işını Kırınımı (XRD) ile belirlenmiştir. Ayrıca üretilen filmlerin yüzeysel ve optiksel özellikleri sırasıyla, Alan Emisyonu Taramalı Elektron Mikroskobu (FESEM) ve UV-Visible Spektroskopisi kullanılarak karakterize edilmiştir. Yapılan bu incelemeler sonucunda, elde edilen ince filmlerin kristal yapıları ayrıntılı olarak incelenerek deney parametrelerinin ve tavlama sıcaklığının ince filmlerin kristalleşmesine etkisi belirlenmiştir.

Deposition and Characterization of Transparent Conductive Oxide ZnO Thin Films By Sol-Gel Spin Coating Technique

Continuously developing optoelectronic technology needs alternative transparent conductive oxide (TCO) materials. TCO materials have many application areas due to their high optical transmittance and being conductive materials. Zinc Oxide (ZnO) thin films are one of the most important members of TCO materials and they are widely used in optoelectronic technology. In this study, ZnO thin films were produced on glass substrate by sol-gel spin coating technique which is a simple and low cost thin film coating technique and produced thin films were annealed at different temperatures in air. By changing parameters of spin coating technique, the conditions of the best film that produced were determined X-Ray Diffraction (XRD). Also the surface and optical properties of the films were characterized by using Field Emission Scanning Electron Microscopy (FESEM) and UV-Visible Spectroscopy respectively. As a result of these studies, by examining the crystal structures of the obtained thin films in detail, the effects of the experimental parameters and the annealing temperature on the crystallization of the thin films were determined.

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Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji-Cover
  • Yayın Aralığı: Yılda 4 Sayı
  • Başlangıç: 2013
  • Yayıncı: Gazi Üniversitesi , Fen Bilimleri Enstitüsü