Systematic optimization of chemical deposition conditions for synthesis ofvanadium(V) oxide xerogels

Systematic optimization of chemical deposition conditions for synthesis ofvanadium(V) oxide xerogels

We performed the optimization of conditions in chemical bath deposition using the design of experimentalmethodology. Factorial design (23) was used for nding the optimal conditions of preparing vanadium(V) oxide xerogelthin lms with better electrochromic properties suitable for electrochemical applications. The thin lms were prepared byacidi cation of NH4VO3aqueous solution with chemical bath deposition. The factors and selected values we consideredwere as follows: the deposition time (10 and 20 min), the deposition temperature (70 and 80◦C), and the mass ofammonium metavanadate (0.3 and 0.5 g). UV-vis spectrometry was used for recording the transmittance variance, ∆T,as the property of interest for modeling in this work. Increasing the deposition temperature and time values led to anincrease in the value of ∆Tat 800 nm wavelength, but the mass of NH4VO3showed the opposite effect. Modelingperformed using a 23factorial design showed that the concentration of the ammonium metavanadate was the singlemost important factor.

___

  • 1.Livage, J.Chem. Mater.1991,3, 578{593.
  • 2.Livage, J.Coord. Chem. Rev.1999,190{192, 391{403.
  • 3.Trikalitis, P. N.; Petkov, V.; Kanatzidis, M. G.Chem. Mater.2003,15, 3337{3342.
  • 4.Benmoussa, M.; Outzourhit, A.; Jourdani, R.; Bennouna, A.; Ameziane, E. L.Act. Passive Electron. Compon.2003,26, 245{256.
  • 5.Costa, C.; Pinheiro, C.; Henriques, I.; Laia, C. A. T.ACS Appl. Mater. Interfaces2012,4, 5266{5275.
  • 6.Najdoski, M.; Koleva, V.; Samet, A.Dalton Trans.2014,43, 12536{12545.
  • 7.Najdoski, M.; Koleva, V.; Samet, A.J. Phys. Chem. C2014,118, 9636{9646.
  • 8.Lundstedt, T.; Seifert, E.; Abramo, L.; Thelin, B.; Nystrom, A.; Pettersen, J.; Bergman, R.Chemometr. Intell.Lab. Sys.1998,42, 3{40.
  • 9.Pierlot, C.; Pawlowski, L.; Bigan, M.; Chagnon, P.Surf. Coat. Tech.2008,202, 4483{4490.
  • 10.Simpson, R. J.; Listak, M. C.; Hutto, T. G.Qual. Engin.2013,25, 333{355.
  • 11.Dejaegher, B.; Heyden, V. Y.J. Pharmaceut. Biomed.2011,56, 141{158.
  • 12.Hibbert, D. B.J. Chromatogr. B2012,910, 2{13.
  • 13.Anderson-Cook, M. C.; Borror, M.C.; Montgomery, C. D.J. Stat. Plan. Infer.2009,139, 629{641.
  • 14.Ferreira, S. L. C.; Bruns, R. E.; Ferreira, H. S.; Matos, G. D.; David, J. M.; Brandao da Silva, E. G. P.; Portugal,L. A.; dos Reis, P. S; Souza, A. S.; dos Santos, W. N. L.Anal. Chim. Acta2007,597, 179{186.
  • 15.Bezerra, M. A.; Santelli, R. E.; Oliveira, E. P.; Villar, L. S.; Escaleira, L. A.Talanta2008,76, 965{977.
  • 16.Kannappan, V.; Mannemala, S. S.Chromatographia2014,77, 1203{1211.
  • 17.De Beer, J. O.; Vandenbroucke, C. V.; Massart, D. L.; De Spiegeleer, B. M.J. Pharm. Biomed. Anal.1996,14,525{541.
  • 18.Marengo, E.; Gennaro, M. C.; Angelino, S.J. Chromatogr. A1998,799, 47{55.
  • 19.Ucakturk, E.;Ozaltn. N.Turk. J. Chem.2013,37, 734{745.145
  • 20.Skartland, L. K.; Mjs, S. A.; Grung, B.J. Chromatogr. A.2011,1218,6823{6831.
  • 21.Aybaster,O.; Sahin, S.; Demir, C.Separ. Sci. Technol.2013,48, 1665{1674.
  • 22.Grosso, C.; Ferreres, F.; Gil-Izquierdo, A.; Valent~ao, P.; Sampaio, M.; Lima, J.Talanta2014,130, 128{136.
  • 23.Akaln, M. K.; Karagoz, S.Anal. Lett.2014,47, 1900{1911.
  • 24.Costa, S.; Barroso, M.; Casta~nera, A.; Dias, M.Anal. Bioanal. Chem.2010,396, 2533{2542.
  • 25.Callao, M. P.Trend. Anal. Chem.2014,62, 86{92.
  • 26.Xu, S.; Adiga, N.; Ba, S.; Dasgupta, T.; Wu, C. F. C; Wang, Z. L.ACS Nano.2009,3, 1803{1812.
  • 27.Terezo, A. J.; Pereira, E. C.Electrochim. Acta2000,45, 4351{4358.
  • 28.Ko, Y. D.; Moon, P.; Kim, C. E.; Ham, M. H.; Myoung, J. M.; Yun, I.Expert. Syst. Appl.2009,36, 4061{4066.
  • 29.Khallaf, H.; Oladeji, I. O.; Chow, L.Thin Solid Films2008,516, 5967{5973.
  • 30.Cole, M. W.; Nothwang, W. D.; Hubbard, C.; Ngo, E.; Ervin, M.J. Appl. Phys.2003,93, 9218{9225.
  • 31.Petkov, V.; Trikalitis, P. N.; Bozin, E. S.; Billinge, S. J. L.; Vogt, T.; Kanatzidis, M. G.J. Am. Chem. Soc.2002,124, 10157{10162.
  • 32.Aldebert, P.; Baffier, N.; Gharbi, N.; Livage, J.Mat. Res. Bull.1981,16, 669{676.
  • 33.Kim, T. A.; Kim, J. H.; Kim, M. G.; Oha, S. M.J. Electrochem. Soc.2003,150, A985{A989.
  • 34.Ramana, C. V.; Smith, R. J.; Hussai, O. M.Phys. Status. Solidi.2003,199, R4-R6.
  • 35.Sun, D.; Kwon, C. W.; Baure, G.; Richman, E.; MacLean, J.; Dunn, B.; Tolbert, S. H.Adv. Funct. Mater.2004,14, 1197{1204.
  • 36.Wang, Z.; Chen, J.; Hu, X.Thin Solid Films2000,375, 238{241.
  • 37.Ozer, N.Thin Solid Films1997,305, 80{87.