ÇİFT TARAFLI YÜKLEME ALTINDA FARKLI MUKOZA KALINLIKLARININ İKİ TİP İMPLANT DESTEKLİ OVERDENTURE DİZAYNI ÜZERİNDEKİ STRES DAĞILIMINA ETKİSİ

Amaç: Bu çalışmanın amacı fotoelastik stres analiz yöntemi kullanılarak çift taraflı yükleme altında farklı mukoza kalınlığının, iki implant destekli mandibular overdenture tasarımları üzerindeki stres dağılımına etkisini değerlendirmektir. Gereç ve Yöntem: Kaninler bölgesine iki adet bağımsız implant (4,0x11 mm; Fixture Osseospeed İmplant, Astra Tech, Mölndal, İsveç) yerleştirilerek altı adet alt çene dişsiz fotoelastik modeller üretildi. Çalışılan ataçman sistemler, locator ve ball stud ataçman sistemlerdi. Ball ve locator grupların her ikisi de, farklı mukoza kalınlıkları (1mm-1mm, 1mm-2mm, 1mm-4mm ) sağlayan farklı rezidüel kret yüksekliğine sahip üç farklı modelden oluşmaktadır. Birinci molarların santral fossalarına çift taraflı olarak 135 N statik vertikal kuvvet uygulandı. Modeller, yükleme altında implantların etrafında ve implantlar arası bölgede izokromatik fringeleri gözlemek için dairesel polariskop alanına yerleştirildi. Fotoelastik stres fringeleri monitörize edildi ve fotoğrafik olarak kaydedildi. Bulgular: Ball ataçman grupların tüm test modellerinde locator gruplardan daha yüksek stres değerleri gözlendi. Her iki ataçman tasarımında en düşük stres değerleri 1mm-1mm mukoza kalınlığındaki modellerde görüldü. Locator grupların ball ataçman gruplara göre stresi daha homojen dağıttığı gözlendi. Sonuç: Bu çalışmanın sonucuna göre, protez yapımı için yerleştirilen implantlar arasında farklı mukoza kalınlıkları varlığında locator ataçman seçimi ball ataçmana göre daha dengeli stres dağılımı sebebiyle avantaj sağlamaktadır. Anahtar Sözcükler: Fotoelastik analiz, mukoza kalınlığı, stres dağılımı, çift taraflı yükleme

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Fotoelastik analiz, mukoza kalınlığı, stres dağılımı

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