Seçkin AKIN, Murat EBİÇ, Faruk ÖZEL, Erdi AKMAN, Şerife AKAR

SnO2 Elektron Transfer Tabakasının Slot-Die Tekniği ile Üretimi ve Optimizasyonu

Mikro ve nano yapılı optoelektronik malzeme endüstrisinin temelini oluşturan, teknolojik ve bilimsel araştırmalarda önemli bir yer tutan ince filmler, son zamanlarda en çok çalışılan güncel araştırma konulardan biridir. Yarıiletken özelliğe sahip metal oksitlerin üretiminde son yıllarda hızlı bir gelişim sergilenmesi rağmen günümüzde ince filmler büyük ölçekli üretim için pek de uygun olmayan döndürerek kaplama (spin-coater) tekniği ile hazırlanmaktadır. Bu çalışmada birçok optoelektronik aygıt teknolojisinin ihtiyaç duyduğu SnO2 metal oksit malzemesi ticari boyutlarda, uygun kalınlıkta ve iyi morfolojik/optik özelliklere sahip olarak slot-die kaplama tekniği ile üretilerek büyütme optimizasyonu gerçekleştirilmiştir. Mevcut slot-die sistemi üzerinde çözelti konsantrasyonu, başlık-alttaş mesafesi, çözelti beslem oranı, kaplama hızı, tabla sıcaklığı gibi çeşitli parametreler değiştirilerek ortam koşullarında en uygun kaplama koşulları belirlenmiştir. SnO2 ince filmler büyük alanlı (25 x 75 mm) alttaşlara başarılı bir şekilde hızlı ve ekonomik slot-die tekniği ile kaplanmış ve literatürde yaygın olarak kullanılan döndürerek kaplama tekniği ile üretilen filmler ile kıyaslanmıştır. Üretilen ince filmlerin optik karakterizasyonları UV-Vis ve fotolüminesans (PL) spektrofotometreleri kullanılarak yapılmıştır. Yüzey ve kesit alan morfolojisi alan emisyon taramalı elektron mikroskobu (FE-SEM) ile karakterize edilmiştir. Bu çalışma slot-die tekniğinin kullanıcılar tarafından daha iyi anlaşılabilmesi ve çeşitli optoelektronik uygulamalarda farklı malzemelerin de bu teknik ile büyük ölçekli olarak üretilmesi konusunda önemli bir yol haritası sunmaktadır.

Anahtar Kelimeler:

İnce Film Teknolojisi, Büyük Ölçekli Üretim, Slot-Die Kaplama Tekniği, SnO2 Elektron Transfer Tabakası

The Production and Optimization of SnO2 Electron Transporting Layer by Slot-Die Technique

Thin films forming the basis of the micro and nano structured optoelectronic industry are one of the most studied research topics and have an important place in technological and scientific research. Although there has been a rapid development in the production of semiconductor metal oxides in recent years, thin films are mostly prepared by spin-coater technique, which is not very suitable for large-scale production. In this study, SnO2 metal oxide material, a highly required material by many optoelectronic device technologies, was produced in commercial sizes, with appropriate thickness and good morphological/optical properties by slot-die coating technique with a detailed optimization processes. By changing various parameters such as solution concentration, head-substrate distance, dispense rate, coating speed, table temperature on the existing slot-die system, the most suitable coating parameters were determined in ambient conditions. SnO2 thin films were successfully coated on large area (25 x 75 mm) substrates by facile and economical slot-die technique under optimum conditions and compared with the films produced by the widely used spin coating technique. Optical characterizations of the ensuing thin films were performed using UV-Vis and photoluminescence (PL) spectrophotometers. Surface and cross-sectional morphology was analyzed by field emission scanning electron microscopy (FE-SEM). This study provides an important roadmap for the deep understanding of the slot-die technique by users and the large-scale production of different materials in various optoelectronic applications.

Keywords:

Thin Film Technology, Large Scale Production, Slot-Die Coating Technique, SnO2 Electron Transporting Layer,

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