Triklosanın Foto-Fenton Benzeri Oksidasyon Yöntemi ile Parçalanması

Triklosan, antibakteriyel kişisel bakım ürünlerinde en çok kullanılan aktif maddelerden biridir ve son yıllarda kullanımı artmıştır. Triklosanın sucul ortamda ki varlığı nedeniyle son yıllarda bu konularda çalışan araştırmacıların dikkatini çekmiştir. Bu çalışmada, triklosanın ileri oksidasyon yöntemlerinden fotoFenton yöntemi ile arıtılması ve yan ürünlerinin oluşumu araştırılmıştır. Triclosan, H2O2 ve Fe(III) derişimlerinin triklosan giderimine olan etkileri, Box-Behnken istatistiksel deney tasarımı ve yüzey cevabı analizi kullanılarak araştırılmıştır. Triklosan'ın tamamen parçalanması bir saatte gerçekleşirken tamamen mineralizasyonu gerçekleşmemiştir. 2,4-Diklorofenol ve 2,4,6Triklorofenol gibi bazı ara bileşiklerin oluştuğu gözlenmiştir. Foto-Fenton benzeri prosesinde, en yüksek triklosan giderimi (%97) için H22/Fe(III)/TCS oranının 50/5/5 olduğu saptanmıştır

Degradation of Triclosan by Photo-Fenton like Oxidation

Triclosan is one of the most used active ingredients in antibacterial personal care products and its usage increased in recent years. Triclosan has recently attracted the attention researchers from the fields of water treatment due to its existence in water environments. This study has been executed to investigate the removal of triclosan with Photo-Fenton like process and to observe by-product formation after oxidation. Effects of operational parameters namely the concentrations of Triclosan, HO2 and Fe(III) on oxidation of triclosan were investigated by using Box-Behnken statistical experiment design and the surface response analysis. Complete removal of triclosan was accomplished within a hour, however, complete mineralization was not occurred even within sixty minutes indicating formation of some intermediate compounds such as 2,4-Dichlorophenol H2O/Fe(III)/TCS ratio resulting by maximum triclosan removal (97%) was found to be 50/5/5, respectively. and 2,4,6-Trichlorophenol. Optimal

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